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Electronics
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交战后地面影响模型
post engagement ground effects model
先触点后平面化蚀刻工艺
planarization after contact etch process
后加热铝平面化
工艺
aluminum-planarization by postheating
process
后向散射截面
monostatic cross section
后向散射截面
back scattering cross-section
后面
板标识
rear label
连接器
后面
connector rear
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